EUV Lithography (SPIE Press Monograph Vol. PM178SC)
| Author | : | |
| Rating | : | 4.74 (790 Votes) |
| Asin | : | 0819496405 |
| Format Type | : | paperback |
| Number of Pages | : | 702 Pages |
| Publish Date | : | 2016-10-20 |
| Language | : | English |
DESCRIPTION:
Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas. . Dr
Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting techn
Dr. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. Akira Endo, Chief Development Manager, Gigaphoton Inc. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. Dr. --Dr.